Intel, NIST Researchers Measure Silicon Chip Dimensions with X-Ray Scattering Tech
The National Institute of Standards and Technology and Intel have used a critical-dimension small angle X-ray scattering method to measure nanostructured features of a silicon computer chip during a collaborative study. NIST said Tuesday it believes the CDSAXS technique could pave the way for development of new process control tools to help semiconductor companies determine the size of […] More